5/12/10

What is CPU Intel 32nm Westmere Process Technology


For a story of the background more will arrive ( in/at ) in the age of Westmere at this time we may receive know become that already in this place we , get come to tell arrive at in detail part of the god Westmere which be the password of the procedure produces for CPU on the procedure produces in 32nm sizes from the way Intel which after succeed like tall with in the age of Nehalem 45nm today the way intel all right begin Westmere 32nm which if we stare go to at the Technology of the production in the part of CPU DIE that already Westmere be Nehalem in 32nm generations or deliver a speech like [ model ] to be simple all right that the lead takes Nehalem come to produce on the procedure produces at 32nm sizes there because pillar all structure still have no many change extremely but from the speech that not very different in this place extremely mark something get that must participate one which part different go out , for the difference has that to happen that a pillar already will exist two together big dot is Westmere will come to and the Technology High-K+Metal Gate in Nation second gel (Second Generation High-K+Metal Gate) which in second age of High-K+Metal Gate here the way Intel as a result still keep have keep a secret stay for the inventory has and all compound that choose to use but the thing that disclose to come out can know that will exist in the part of the thick reduction of High-K Dielectric Gate down 0.1nm by from originally will have the thick 1.0nm on the procedure produces 45nm come to is 0.9nm with CPU in the procedure produces 32nm and besides still get decrease the wideness of Gate be left 30nm which be the size that is down originally from about 0.7x (0.7 times ) which from the size that have the change here of C fat [ P letter ] urge in 32nm way sizes intel get K the wind takes to keep that help increase efficiency give with Transistor get 22% more than which that mark the change to that Westmere , effective that have advantage over Nehalem 22% alike more and not only from the test in about [ story ] of size both of the thick reduction and the wideness of Gate this still help decrease leakage rate of Electron in the part of NMOS get more than 5 times and PMOS get more 10 times originally from in procedure size produces that 45nm which for this case may enough [ when ] know ? already that if there is leakage rate of the trend or Electron , that less will cause work temperature of CPU has the temperature decreases to lower which affect from the level will of using energy to will decrease to lower there from at the beginning in this place we can can summarize ? already that Westmere and Nehalem that have how is the difference ? but it still exist one again the dot that has the addition comes in to are in the part of Instructions at have the expansion comes in of AES instructions (Advanced Encryption Standard) which be the instruction set for coding and decrypt in the level Hardware area intel get pack down go to resemble with at coming in of the instruction set SSE4.1 and SSE4.2, in the age of Penryn there and for in the all detail of the instruction set AES this that our way has will the mention in detail again during next ..

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